This year’s program focuses on “Cross-Border Conflicts in Litigation and Licensing.” We will be hearing about licensing of designs, copyright, and both patent and non-patent rights. The program is free of charge and CLE credit is available. Simultaneous translation (English/Chinese) will be provided. The agenda and registration information are available here.. We have a great group of speakers from industry, academia, the judiciary, and government with two panels each day.

This is also a great complement to USPTO’s 90-minute program on licensing technical IP in China, on June 9, 2022.