SIPO and USPTO will be co-sponsoring a program on IPR issues of concern to conducting R&D in China. The seminar will bring together government officials, senior IP and accounting experts, and corporate IP counsels to provide information of value to R&D centers in China. The event will be held on May 31, 2016 at 8:30 a.m.-5:00 p.m. at the InterContinental Nanjing, address: 1 Zhongyang Road, Gulou District, Nanjing, Jiangsu.
A summary of the sessions are included below:
研讨会由如下7个主题构成：
Session 1: U.S.-China Current R&D and Collaboration Environments
主题1： 中美当前的研发和协作环境
Session 2: The Roles of IP in the Research and Development Process
主题2： 知识产权在研发过程中的角色
Session 3: Protecting Your IP: Discussion on IP Filing Strategies in U.S. and China
主题3： 保护你的知识产权：对中美知识产权申请战略的讨论
Session 4: Commercializing Your Innovations
主题4： 创新的商业化
Session 5: Drafting and Negotiating IP License Agreements – Domestic and Technology Imports; Intercompany Ownership and Transfers
主题5： 知识产权许可协议的起草和谈判–技术进口；公司间的所有权和转让
Session 6: High and New Technology Enterprises and R&D Tax Breaks
主题6： 高新技术企业和研发税收减免
Session 7: Panel Discussion of US and Chinese Experts on IP related opportunities and challenges for companies with R&D facilities in China
主题7： 圆桌讨论：中美专家就在华设立研发中心的企业面临的知识产权机遇和挑战的讨论
Please RSVP by May 24, 2016 to Aster CHEN at PTO_Shanghai_Office@trade.gov (Please include your name, title and company/organization). Seats are limited to 100 on a first-come first-serve basis.
请在2016年5月24日前回复陈书新 PTO_Shanghai_Office@trade.gov 确认出席,回复时请提供您的姓名、职务及单位/机构名称。100个席位,先到先得
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