SIPO and USPTO will be co-sponsoring a program on IPR issues of concern to conducting R&D in China. The seminar will bring together government officials, senior IP and accounting experts, and corporate IP counsels to provide information of value to R&D centers in China. The event will be held on May 31, 2016 at 8:30 a.m.-5:00 p.m. at the InterContinental Nanjing, address: 1 Zhongyang Road, Gulou District, Nanjing, Jiangsu.
A summary of the sessions are included below:
Session 1: U.S.-China Current R&D and Collaboration Environments
Session 2: The Roles of IP in the Research and Development Process
Session 3: Protecting Your IP: Discussion on IP Filing Strategies in U.S. and China
Session 4: Commercializing Your Innovations
Session 5: Drafting and Negotiating IP License Agreements – Domestic and Technology Imports; Intercompany Ownership and Transfers
Session 6: High and New Technology Enterprises and R&D Tax Breaks
Session 7: Panel Discussion of US and Chinese Experts on IP related opportunities and challenges for companies with R&D facilities in China
Please RSVP by May 24, 2016 to Aster CHEN at PTO_Shanghai_Office@trade.gov (Please include your name, title and company/organization). Seats are limited to 100 on a first-come first-serve basis.
请在2016年5月24日前回复陈书新 PTO_Shanghai_Office@trade.gov 确认出席,回复时请提供您的姓名、职务及单位/机构名称。100个席位,先到先得
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